- HWCVD technology of silicon carbide thin films: Properties
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HWCVD technology of silicon carbide thin films: Properties

  1. HWCVD technology of silicon carbide thin films: Properties / aut. Jozef Huran, Miroslav Mikolášek, Pavol Boháček, Angela Kleinová, Vlasta Sasinková, Alexander P Kobzev, Mária Sekáčová, J Arbet
    Huran Jozef  Mikolášek Miroslav ; 033000 Boháček Pavol Kleinová Angela Sasinková Vlasta Kobzev Alexander P. Sekáčová Mária Arbet J.
    ADEPT 2015 : . S. 104-107
    SiC HWCVD structural and electrical characterization solar structure
    článok zo zborníka
    AFD - Reports at home scientific conferences
    V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka
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Number of the records: 1  

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