- HWCVD technology of silicon carbide thin films: Properties
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HWCVD technology of silicon carbide thin films: Properties

  1. HURAN, Jozef et al. HWCVD technology of silicon carbide thin films: Properties. In ADEPT 2015 : 3rd international conference on advances in electronic and photonic technologies. Štrbské Pleso, High Tatras, Slovakia. June 1-4, 2015. 1. vyd. Žilina : University of Žilina, 2015, S. 104-107. ISBN 978-80-554-1033-3. E*790/UEF/2015
Number of the records: 1  

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